Yi Xiu Xie

Title: Yi Xiu Xie: Innovator in Semiconductor Technology

Introduction

Yi Xiu Xie is a prominent inventor based in Minxiong, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique semiconductor device that incorporates a stress relief feature.

Latest Patents

Yi Xiu Xie holds 1 patent for his invention titled "Semiconductor device with stress relief feature and method therefor." This patent describes a method of manufacturing a semiconductor device that includes placing a package substrate on a carrier substrate. The process involves forming a frame on the package substrate and affixing an active side of a semiconductor die on the package substrate. A cavity is created between the semiconductor die and the package substrate, and at least a portion of both components is encapsulated with an encapsulant. The frame is designed to prevent the encapsulant from entering the cavity, ensuring the integrity of the semiconductor device.

Career Highlights

Yi Xiu Xie is currently employed at NXP B.V., a leading company in the semiconductor industry. His work focuses on advancing semiconductor technologies and improving manufacturing processes. His expertise has been instrumental in developing innovative solutions that enhance device performance.

Collaborations

Throughout his career, Yi Xiu Xie has collaborated with talented professionals, including Tzu Ya Fang and Yen-Chih Lin. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Yi Xiu Xie's contributions to semiconductor technology exemplify the spirit of innovation. His patented methods and collaborative efforts continue to influence the industry positively. His work not only advances technology but also inspires future inventors in the field.