Yi Sheng Wu

Title: Yi Sheng Wu: Innovator in Photoresist Technology

Introduction

Yi Sheng Wu is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of photoresist technology, which is essential in the manufacturing of optical films. His innovative work has led to the development of a unique photoresist composition that enhances the quality and efficiency of optical films.

Latest Patents

Yi Sheng Wu holds a patent for a photoresist composition, optical film thereof, and the preparing method of the optical film. The patent describes a photoresist composition that includes an alkali soluble resin, a photopolymerizable compound, a photoinitiator, a thermal initiator, a black colorant, and a solvent. The photopolymerizable compound contains at least one ethylenically unsaturated monomer and at least one epoxy compound. This invention not only provides a novel composition but also outlines a method for preparing the optical film, showcasing Wu's expertise in this specialized area.

Career Highlights

Yi Sheng Wu is associated with Echem Solutions Corp., where he applies his knowledge and skills in the development of advanced materials. His work at the company has positioned him as a key player in the field of optical film technology. His dedication to innovation is evident in his patent, which reflects his commitment to improving industry standards.

Collaborations

One of his notable coworkers is Hao Lun Huang. Their collaboration may contribute to further advancements in the field, although specific details about their joint projects are not available.

Conclusion

Yi Sheng Wu's contributions to photoresist technology through his patent demonstrate his innovative spirit and technical expertise. His work at Echem Solutions Corp. continues to influence the industry positively.