Sammamish, WA, United States of America

Yi Ma

This inventor holds 1 USPTO granted patent. Top assignee: Fd3m, Inc.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yi Ma. Retrieved from https://idiyas.com/inventor/yi-ma-5szf65ts

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Yi Ma - Innovator in Microwave Plasma Technology

Introduction

Yi Ma is a prominent inventor based in Sammamish, WA (US). He has made significant contributions to the field of microwave plasma technology, particularly in the synthesis of diamond films. His innovative approach has led to the development of a unique device that enhances the efficiency of diamond synthesis.

Latest Patents

Yi Ma holds a patent for a "Microwave plasma chemical vapor deposition device and application thereof." This device is designed for diamond synthesis and utilizes a microwave source to generate a microwave signal. The resonant cavity of the device receives a plurality of process gases, allowing for the effective deposition of diamond films on a seed.

Career Highlights

Throughout his career, Yi Ma has focused on advancing the technology behind microwave plasma chemical vapor deposition. His work has been instrumental in improving the processes involved in diamond synthesis, making it more efficient and effective. He is currently associated with Fd3m, Inc., where he continues to innovate in this specialized field.

Collaborations

Yi Ma has collaborated with notable colleagues, including Jinhua Zhu and Christopher E. Griffin. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Yi Ma's contributions to microwave plasma technology and diamond synthesis are noteworthy. His innovative patent and collaborative efforts highlight his commitment to advancing this field. His work continues to inspire future innovations in material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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