Yi Han Yang

Title: Yi Han Yang: Innovator in Chemical Mechanical Polishing Slurry

Introduction

Yi Han Yang is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of chemical mechanical polishing, particularly with his innovative slurry formulation. His work is essential for enhancing the polishing performance of stainless steel substrates.

Latest Patents

Yi Han Yang holds a patent for a chemical mechanical polishing slurry. This slurry comprises 10-50 wt % of abrasive particles, 0.001-2.0 wt % of a coolant, 0.001-1.0 wt % of an oxidant, 10-5000 ppm of a lubricity improver, and 10-5000 ppm of a foam inhibitor. The particle size of the abrasive particles ranges from 20-500 nm. This alkaline polishing slurry is designed to improve polishing performance, surface quality, and surface passivation after the chemical-mechanical polishing process.

Career Highlights

Yi Han Yang is associated with Uwiz Technology Co., Ltd., where he applies his expertise in developing advanced polishing solutions. His innovative approach has positioned him as a key player in the industry.

Collaborations

He has collaborated with notable coworkers, including Wen Cheng Liu and Ming Che Ho, to further enhance the development of polishing technologies.

Conclusion

Yi Han Yang's contributions to the field of chemical mechanical polishing slurry demonstrate his commitment to innovation and excellence. His work continues to impact the industry positively.