This inventor holds 3 USPTO granted patents and 2 published patent applications. Top assignee: Avago Technologies General IP (Singapore) Pte. Ltd.. Active years: 2014-2016.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2014-2016
Title: Yi Feng Hwang: Innovator in Thermal Insulation and Display Technology
Introduction
Yi Feng Hwang is a notable inventor based in Penang, Malaysia. He has made significant contributions to the fields of thermal insulation and display technology. With a total of 3 patents to his name, Hwang continues to push the boundaries of innovation in his industry.
Latest Patents
Hwang's latest patents include a "Threaded insert with thermal insulation capability." This thermally-insulative insert device is designed to reduce heat transfer between an assembled part and a heat source. It features internal and external threads, allowing for easy attachment while maintaining thermal efficiency. Additionally, he has developed a "Leadframe-based surface mount technology segmented display design and method of manufacture." This multi-segment display is engineered to eliminate hotspots and color discoloration, enhancing the overall performance and reliability of surface-mounted displays.
Career Highlights
Hwang is currently employed at Avago Technologies General IP (Singapore) Pte. Ltd. His work focuses on advancing technologies that improve product efficiency and user experience. His innovative designs have garnered attention in the tech community, showcasing his expertise and commitment to excellence.
Collaborations
Hwang collaborates with talented colleagues, including Chuan Hoe Chan and Choon Guan Ko. Together, they contribute to the development of cutting-edge technologies that address modern challenges in their respective fields.
Conclusion
Yi Feng Hwang is a distinguished inventor whose work in thermal insulation and display technology exemplifies innovation and creativity. His patents reflect a commitment to improving technology for practical applications. Hwang's contributions continue to influence the industry and inspire future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
