Company Filing History:
Years Active: 2023
Title: Yi-Chang Chang: Innovator in Photoresist Removal Technology
Introduction
Yi-Chang Chang is a notable inventor based in Yunlin County, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of photoresist removal.
Latest Patents
Yi-Chang Chang holds a patent for an "Apparatus and method for removing photoresist layer from alignment mark." This innovative apparatus is designed to efficiently remove a photoresist layer from at least one alignment mark of a wafer. The apparatus includes a holder to support the wafer, a solvent dispenser to spray a solvent onto the photoresist layer, and a suction unit to remove the dissolved photoresist layer and solvent from the wafer.
Career Highlights
Yi-Chang Chang is currently associated with Visera Technologies Company Limited, where he continues to develop and refine technologies that enhance semiconductor processing. His work has been instrumental in improving the efficiency and effectiveness of photoresist removal processes.
Collaborations
Some of his coworkers include Yuan-Chun Chao and Tian-Wen Liao, who collaborate with him on various projects within the company.
Conclusion
Yi-Chang Chang's contributions to the field of semiconductor technology, particularly through his innovative patent, highlight his role as a key inventor in the industry. His work continues to influence advancements in manufacturing processes.