The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2023
Filed:
Apr. 11, 2017
Visera Technologies Company Limited, Hsin-Chu, TW;
Yuan-Chun Chao, Hsinchu, TW;
Tian-Wen Liao, New Taipei, TW;
Wei-Chuan Chen, Changhua County, TW;
Yi-Chang Chang, Yunlin County, TW;
Yu-Ming Tseng, Hsinchu, TW;
VISERA TECHNOLOGIES COMPANY LIMITED, Hsin-Chu, TW;
Abstract
An apparatus for removing a photoresist layer from at least one alignment mark of a wafer is provided. The apparatus includes a holder, a solvent dispenser, and a suction unit. The holder is used to support the wafer, wherein the alignment mark is formed in a peripheral region of the wafer. The solvent dispenser is used to spray a solvent onto the photoresist layer on the alignment mark of the wafer to generate a dissolved photoresist layer. The suction unit is used to remove the dissolved photoresist layer and the solvent from the wafer through exhausting.