Singapore, Singapore

Yew Hoong Phang


Average Co-Inventor Count = 2.3

ph-index = 3

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2005-2006

Loading Chart...
3 patents (USPTO):Explore Patents

Title: Innovations by Yew Hoong Phang

Introduction

Yew Hoong Phang is a notable inventor based in Singapore, recognized for his contributions to the field of chemical-mechanical polishing. He holds three patents that showcase his innovative designs aimed at improving wafer processing techniques.

Latest Patents

One of his latest patents is the "Retaining ring structure for edge control during chemical-mechanical polishing." This invention presents an improved design for a retaining ring used in chemical mechanical polishing machines. The design features a plurality of straight slurry delivery grooves, angled in the direction of rotation, with alternate channels recessed to prevent contact with the polishing pad. This innovative structure allows for superior flexibility and instantaneous in-situ control of the polishing rate at the wafer's edge. For a 200 mm diameter wafer, the effective contact length of the segmented tabs is about 11.5% of the wafer perimeter, ensuring proper containment during polishing while maintaining a large area of undistorted polishing pad. By adjusting the operating pressures of the polishing head, varying polishing rates can be achieved at the edge compared to the overall wafer polishing rate. This retaining ring design offers a simpler and more cost-effective solution for enhancing wafer edge polishing rates and increasing usable wafer area.

Career Highlights

Yew Hoong Phang has worked with prominent companies such as Tech Semiconductor Singapore Pte Ltd and Tech Semiconductor Pte. Ltd. His experience in these organizations has contributed to his expertise in the semiconductor industry and the development of innovative polishing solutions.

Collaborations

Throughout his career, Yew Hoong Phang has collaborated with talented individuals, including Jianguang Chang and Jian Sun. These partnerships have likely fostered a creative environment that has led to significant advancements in their field.

Conclusion

Yew Hoong Phang's innovative contributions to chemical-mechanical polishing demonstrate his commitment to enhancing wafer processing techniques. His patents reflect a deep understanding of the challenges in the industry and provide effective solutions that benefit semiconductor manufacturing.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…