Yew Heng Tan

Title: The Innovative Contributions of Yew Heng Tan

Introduction

Yew Heng Tan is a prominent inventor based in Singapore, known for his significant contributions to semiconductor technology. With one registered patent to his name, Tan's work is characterized by its innovative approach to the manufacturing processes of specialized substrates. His expertise has gained recognition in the academic and technological communities, particularly during his tenure at renowned institutions.

Latest Patents

Yew Heng Tan's notable patent is titled "Method of Manufacturing a Germanium-on-Insulator Substrate." This innovative method involves several key steps: first, it provides a first semiconductor substrate and a second semiconductor substrate containing a germanium layer. Next, the process involves bonding these substrates through at least one dielectric material to create a combined substrate, with the germanium layer strategically placed between the two substrates. Following that, it removes the second semiconductor substrate to expose part of the germanium layer, specifically highlighting the presence of misfit dislocations. Finally, the method includes an annealing process that allows for the elimination of these dislocations, significantly enhancing the quality of the germanium layer.

Career Highlights

In his career, Yew Heng Tan has made noteworthy strides in the field of semiconductor research. He has worked at prestigious institutions such as the Massachusetts Institute of Technology (MIT) and Nanyang Technological University, where he has contributed to various research projects and collaborated with other professionals in the field.

Collaborations

Throughout his career, Tan has worked alongside accomplished colleagues, including Kwang Hong Lee and Chuan Seng Tan. These collaborations have played a vital role in his development as an inventor, positioning him within a network of innovators who are shaping the future of technology.

Conclusion

Yew Heng Tan's innovative methods in semiconductor manufacturing, especially with his patented technology, exemplify the impact of research and collaboration in advancing industrial applications. His contributions continue to resonate within the technological fields, paving the way for future advancements in materials science and semiconductor technology.