Hong Kong, China

Yeuk Lung Ho

This inventor holds 1 USPTO granted patent. Top assignee: The Hong Kong University of Science and Technology. Active years: 2026.


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Yeuk Lung Ho: Innovator in Thin Film Polarizers

Introduction

Yeuk Lung Ho is a prominent inventor based in Hong Kong, CN. He has made significant contributions to the field of materials science, particularly in the development of bis-azo dyes for thin film polarizers. His innovative work has led to advancements in optical technologies.

Latest Patents

Yeuk Lung Ho holds a patent for "Bis-azo dyes for thin film polarizers and synthesis method." This patent describes a dichroic bis-azo biphenyl dye, where the substituents R, R, R, and R are alkyl or alkenyl groups with n ranging from 1 to 18. Notably, at least one substituent among R, R, R, and R is different from the others. The patent outlines a benzidine-free method for synthesizing this dye, utilizing a cross-coupling reaction, which may include a Suzuki reaction. The resulting polarizer, formed from a photoaligned layer of the bis-azo biphenyl dye on a substrate, exhibits a dichroic ratio of at least 40. Furthermore, chemical modification of the photoaligned dye layer results in a broad-band thin film polarizer characterized by low light scattering and high thermal and photo tolerances.

Career Highlights

Yeuk Lung Ho is affiliated with The Hong Kong University of Science and Technology, where he continues to engage in research and development in the field of optical materials. His work has garnered attention for its practical applications in various industries.

Collaborations

Yeuk Lung Ho collaborates with Valerii Vladimirovich Vashchenko, contributing to the advancement of their shared research interests.

Conclusion

Yeuk Lung Ho's innovative work in bis-azo dyes and thin film polarizers exemplifies the impact of research on optical technologies. His contributions continue to influence the field and pave the way for future advancements.

Profile summary based on public USPTO records.
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