Yongin, South Korea

Yeonguk Kim

This inventor holds 1 USPTO granted patent and 12 published patent applications. Top assignee: Samsung Display Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yeonguk Kim. Retrieved from https://idiyas.com/inventor/yeonguk-kim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 10.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Yeonguk Kim - Innovator in Voltage Waveform Control

Introduction

Yeonguk Kim is an inventor based in Suwon-si, South Korea. He has made significant contributions to the field of voltage waveform control. His innovative approach focuses on enhancing substrate processing methods and apparatus.

Latest Patent Applications

Yeonguk Kim's notable patent application is titled "VOLTAGE WAVEFORM CONTROLLING METHOD, SUBSTRATE PROCESSING METHOD, AND SUBSTRATE PROCESSING APPARATUS." This application outlines a voltage waveform control method that generates a non-sinusoidal wave. The method includes a pulse period with a positive bias voltage and a ramp period with a negative bias voltage. It also describes a first transition period that changes from the pulse period to the ramp period, and a second transition period that changes from the ramp period back to the pulse period. The application emphasizes adjusting the length of the negative voltage period to be at most 20% of the total length of the waveform period. Additionally, it discusses adjusting the slope of the ramp period and outputting an adjusted voltage waveform based on these parameters.

Conclusion

Yeonguk Kim's work in voltage waveform control showcases his innovative spirit and dedication to advancing technology in substrate processing. His contributions, although not yet reflected in granted patents, hold promise for future developments in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…