Daedeok-gu, South Korea

Yeonghun Kim

This inventor holds 1 USPTO granted patent. Top assignees: Dnf Co., Ltd, Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yeonghun Kim. Retrieved from https://idiyas.com/inventor/yeonghun-kim-dcbb1s43

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Yeonghun Kim: Innovator in Silicon Compounds

Introduction

Yeonghun Kim is a notable inventor based in Daedeok-gu, South Korea. He has made significant contributions to the field of integrated circuit devices through his innovative work with silicon compounds. His expertise and creativity have led to the development of a unique patent that showcases his technical skills.

Latest Patents

Yeonghun Kim holds a patent for a silicon compound and a method of manufacturing integrated circuit devices using the same. The patent is represented by the chemical formula: R1(OR2)(OR3)Si—O—SiR4(OR5)(OR6). This invention highlights the potential of silicon compounds in enhancing the performance and efficiency of integrated circuits.

Career Highlights

Throughout his career, Yeonghun Kim has worked with prominent companies, including Samsung Electronics Ltd. and DNF Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to various innovative projects in the technology sector.

Collaborations

Yeonghun Kim has collaborated with talented individuals in his field, including his coworker Sunhye Hwang. These partnerships have fostered an environment of creativity and innovation, leading to advancements in their respective areas of expertise.

Conclusion

Yeonghun Kim's contributions to the field of silicon compounds and integrated circuit devices demonstrate his commitment to innovation and excellence. His patent and career achievements reflect his significant impact on technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…