Seoul, South Korea

Yeong-Min Lim

This inventor holds 1 USPTO granted patent. Top assignee: Industry-University Cooperation Foundation Hanyang University. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yeong-Min Lim. Retrieved from https://idiyas.com/inventor/yeong-min-lim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Yeong-Min Lim: Innovator in Substrate Treatment Technology

Introduction

Yeong-Min Lim is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of substrate treatment technology, showcasing his innovative spirit through his patented inventions.

Latest Patents

One of Yeong-Min Lim's notable patents is a substrate treating apparatus. This invention relates to a device designed to enhance the treatment of substrates. The apparatus comprises a chamber, a susceptor to support the substrate, an electrode plate for plasma generation, an RF power supply, and a plasma control member. This innovative design aims to improve the efficiency and effectiveness of substrate treatment processes.

Career Highlights

Yeong-Min Lim is affiliated with the Industry-University Cooperation Foundation at Hanyang University. His work in this institution has allowed him to bridge the gap between academic research and practical applications in the industry. His dedication to advancing technology in substrate treatment has positioned him as a key figure in his field.

Collaborations

Yeong-Min Lim collaborates with Chin-Wook Chung, contributing to the development of innovative solutions in substrate treatment technology. Their partnership exemplifies the importance of teamwork in driving technological advancements.

Conclusion

Yeong-Min Lim's contributions to substrate treatment technology through his patent demonstrate his commitment to innovation. His work continues to influence the industry and inspire future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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