Company Filing History:
Years Active: 2012
Title: Yeon Sik Jung: Innovator in Block Copolymer Technologies
Introduction
Yeon Sik Jung is a prominent inventor based in Cambridge, MA, known for his significant contributions to the field of block copolymer technologies. With a total of 2 patents, he has made strides in developing innovative methods for integrated circuit interconnects and nanolithography.
Latest Patents
His latest patents include "Guided self-assembly of block copolymer line structures for integrated circuit interconnects." This invention focuses on creating complex self-assembled patterns using a sparse template, allowing for precise control over the orientation of linear features. The method involves arranging posts in a template that occupies only a small area of the final patterns, enabling the introduction of local aperiodic features. Another notable patent is "Orientation-controlled self-assembled nanolithography using a block copolymer." This patent describes a structure made of a trench patterned substrate and a block copolymer, which can form either perpendicular or parallel cylinders based on specific parameters.
Career Highlights
Yeon Sik Jung is affiliated with the Massachusetts Institute of Technology, where he continues to push the boundaries of research in his field. His work has implications for the fabrication processes of various structures, enhancing the efficiency and effectiveness of integrated circuits.
Collaborations
He has collaborated with esteemed colleagues such as Caroline Anne Ross and Joel K W Yang, contributing to a rich environment of innovation and research.
Conclusion
Yeon Sik Jung's work exemplifies the intersection of creativity and technology in the realm of block copolymers. His patents reflect a commitment to advancing the field and addressing complex challenges in integrated circuit design.