Yen-Shuo Lin

Title: Yen-Shuo Lin: Innovator in Deep Learning and Metrology

Introduction

Yen-Shuo Lin is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of metrology and deep learning, holding 2 patents that showcase his innovative approach to technology.

Latest Patents

One of his latest patents is titled "Deep learning based adaptive alignment precision metrology for digital overlay." This invention relates to a system and methods that accurately align subsequent patterned layers in a photoresist using a deep learning model. The model is trained to recognize unique device patterns, referred to as alignment patterns, within the field of view of the camera. The cameras in the lithography system capture images of these alignment patterns, allowing the deep learning model to identify them effectively. The invention aims to enhance the precision of lithography processes by generating an alignment model based on a shift and rotation model output from the deep learning model.

Another significant patent is "Trial frame and method for measuring key parameter thereof." This patent describes a trial frame that includes a body and at least one measurement subject with a visual invariant geometric characteristic. The trial frame body contains key parameters, and the measurement subject collaborates with a measurement method. An image capturing device records a two-dimensional image of the measurement subject, enabling the deduction of key parameters from the captured image.

Career Highlights

Yen-Shuo Lin has worked with prominent organizations such as Applied Materials, Inc. and National Yang Ming Chiao Tung University. His experience in these institutions has contributed to his expertise in the fields of metrology and deep learning.

Collaborations

Throughout his career, Yen-Shuo Lin has collaborated with talented individuals, including Yi-Yu Hsieh and Tamer Coskun. These collaborations have further enriched his work and innovations.

Conclusion

Yen-Shuo Lin is a distinguished inventor whose work in deep learning and metrology has led to significant advancements in technology. His patents reflect his commitment to innovation and precision in the field.