Taoyuan, Taiwan

Yen-Cheng Li

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Everlight Chemical Industrial Corporation. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yen-Cheng Li. Retrieved from https://idiyas.com/inventor/yen-cheng-li-01bhj8eo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Yen-Cheng Li: Innovator in Photoresist Technology

Introduction

Yen-Cheng Li is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of photoresist technology, particularly with his innovative approaches to thick film applications. His work has implications for various industries, including electronics and materials science.

Latest Patents

Yen-Cheng Li holds a patent for a "Negative-type photoresist composition for thick film." This invention involves a unique composition that includes an alkali-soluble resin, crosslinkers, photo initiators, and solvents. The specific formulation allows for enhanced performance in thick film applications, making it a valuable asset in the field.

Career Highlights

Li is associated with Everlight Chemical Industrial Corporation, where he continues to develop and refine his inventions. His expertise in photoresist compositions has positioned him as a key player in the industry, contributing to advancements in material technology.

Collaborations

Yen-Cheng Li has collaborated with talented individuals such as Yi Jing Chen and Nai Tien Chou, who have supported his innovative endeavors. Their teamwork has fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Yen-Cheng Li's contributions to photoresist technology exemplify the spirit of innovation. His patent and collaborative efforts highlight the importance of teamwork in advancing scientific knowledge and practical applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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