Yehuda Odes

Title: Yehuda Odes: Innovator in Machine Learning for Metrology

Introduction

Yehuda Odes is a prominent inventor based in Kiryat Ata, Israel. He has made significant contributions to the field of metrology through his innovative use of machine learning algorithms. With a total of 2 patents, Odes is recognized for his advancements that enhance measurement accuracy and process efficiency.

Latest Patents

Odes' latest patents focus on the application of machine learning for metrology measurements. These patents provide methods, modules, and systems that utilize machine learning algorithms to improve metrology accuracy and overall process throughput. The methods involve calculating training data concerning metrology metrics from initial measurements, applying machine learning algorithms to derive estimation models, and using images of sites on received wafers to derive measurement data. Notably, while the training data may use two images per site, a single image per site can suffice in operation, significantly reducing measurement time to less than half of the current duration. Additionally, confidence scores can be derived for enhanced metrology and process control, with deep learning techniques further improving accuracy and speed.

Career Highlights

Yehuda Odes is currently employed at Kla Corporation, a company known for its cutting-edge technology in the semiconductor industry. His work at Kla Corporation has positioned him as a key player in the development of innovative metrology solutions.

Collaborations

Odes collaborates with notable colleagues, including Boaz Ophir and Udi Shusterman. Their combined expertise contributes to the advancement of machine learning applications in metrology.

Conclusion

Yehuda Odes is a distinguished inventor whose work in machine learning for metrology has the potential to revolutionize measurement processes. His contributions are paving the way for more efficient and accurate metrology systems in the industry.