Yehuda Demayo

Title: Innovations of Yehuda Demayo in Titanium Nitride Film Technology

Introduction

Yehuda Demayo is a notable inventor based in San Jose, California, recognized for his contributions to the field of materials science, particularly in the development of titanium nitride (TiN) films. With a total of two patents to his name, Demayo has made significant advancements that enhance the performance and application of TiN in various industries.

Latest Patents

Demayo's latest patents include a method of depositing a thick titanium nitride film and a method for the CVD deposition of a low residual halogen content multi-layered titanium nitride film. The first patent describes a technique for forming a TiN layer through a reaction between ammonia and titanium tetrachloride, utilizing specific ratios and temperatures to achieve optimal results. The second patent focuses on producing TiN films with a thickness greater than 1000 angstroms, employing a multi-deposition process that ensures low resistivity and minimal micro cracks.

Career Highlights

Yehuda Demayo is currently employed at Applied Materials, Inc., a leading company in the semiconductor and materials engineering sector. His work at Applied Materials has allowed him to push the boundaries of TiN film technology, contributing to advancements that are crucial for small geometry plug fill applications.

Collaborations

Demayo has collaborated with esteemed colleagues such as Ming Xi and Jianhua Hu, further enhancing the innovative environment at Applied Materials. Their combined expertise has led to significant breakthroughs in the field of materials science.

Conclusion

Yehuda Demayo's innovative work in titanium nitride film technology exemplifies the impact of dedicated inventors in advancing material applications. His patents not only reflect his expertise but also contribute to the ongoing evolution of semiconductor technologies.