Rishon Lezion, Israel

Yehiel Nadav

This inventor holds 1 USPTO granted patent. Top assignee: Xsight Systems Ltd.. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yehiel Nadav. Retrieved from https://idiyas.com/inventor/yehiel-nadav

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2015

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Yehiel Nadav: Innovator in Airport Safety Technology

Introduction

Yehiel Nadav is a prominent inventor based in Rishon Lezion, Israel. He has made significant contributions to airport safety technology, particularly through his innovative patent. His work focuses on enhancing the safety and efficiency of airport operations.

Latest Patents

Yehiel holds a patent for an "Airport travel surface edge lighting and foreign object detection system and method." This invention features an object detection system designed for airports, which includes an airport travel surface light assembly. It also incorporates a rotatable sensor assembly mounted on the light assembly for sensing objects, along with an omnidirectional illuminator positioned above the sensor assembly.

Career Highlights

Yehiel is associated with Xsight Systems Ltd., a company dedicated to advancing airport safety technologies. His role at the company has allowed him to focus on developing innovative solutions that address critical safety concerns in airport environments.

Collaborations

Yehiel collaborates with talented individuals such as Aviv Goner and Alon Nitzan. Their combined expertise contributes to the development of cutting-edge technologies in the field of airport safety.

Conclusion

Yehiel Nadav's contributions to airport safety through his innovative patent demonstrate his commitment to enhancing operational safety in aviation. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…