Singapore, Singapore

Yeh Ching Andrew Nee

This inventor holds 1 USPTO granted patent. Top assignee: National University of Singapore. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yeh Ching Andrew Nee. Retrieved from https://idiyas.com/inventor/yeh-ching-andrew-nee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 11.0

ph-index = 1


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Yeh Ching Andrew Nee: Innovator in Optical Stereolithography

Introduction

Yeh Ching Andrew Nee is a notable inventor based in Singapore, recognized for his contributions to the field of optical stereolithography. His innovative approach has led to advancements in rapid prototyping technologies, making significant impacts in various industries.

Latest Patents

One of his key patents is titled "Method for determining resin curing areas in an optical stereolithography process." This patent outlines a method for determining the areas of resin to be cured in an optical stereolithography process. The process involves generating a computer model of the desired shape and dividing it into layers of a specific thickness. The method ensures that the areas in the intermediate layer of resin, which may be oversized due to laser curing, are accurately determined and compensated for in the 2-D layer data used to build a 3-D model.

Career Highlights

Yeh Ching Andrew Nee is affiliated with the National University of Singapore, where he has been instrumental in research and development in the field of stereolithography. His work has contributed to enhancing the efficiency and accuracy of rapid prototyping techniques.

Collaborations

He has collaborated with notable colleagues, including Ying His Jerry Fuh and En Tang Kang, who have also contributed to advancements in related fields.

Conclusion

Yeh Ching Andrew Nee's innovative methods in optical stereolithography exemplify the importance of research and development in modern technology. His contributions continue to influence the landscape of rapid prototyping and resin curing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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