Zichron Yaakov, Israel

Yechiel Lamash

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yechiel Lamash. Retrieved from https://idiyas.com/inventor/yechiel-lamash-5ead5r6j

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Yechiel Lamash - Innovator in Video Processing Technology

Introduction

Yechiel Lamash is a notable inventor based in Zichron Yaakov, Israel. He has made significant contributions to the field of video processing technology, particularly in the extraction of logo masks from video streams.

Latest Patents

Yechiel holds a patent for a method of extracting a logo mask from a video stream that contains a logo. This innovative method involves receiving a video stream with multiple frames and generating online-weighted-average frames. A logo-boundary-score map is created to identify logo-boundary pixels, ultimately resulting in a logo mask that distinguishes between logo and non-logo pixels.

Career Highlights

Yechiel is currently employed at Samsung Electronics Co., Ltd., where he applies his expertise in video processing. His work has contributed to advancements in how logos are detected and processed in video content.

Collaborations

Throughout his career, Yechiel has collaborated with talented individuals such as Shai Litvak and Tomer Avidor. These collaborations have fostered innovation and enhanced the development of new technologies in their field.

Conclusion

Yechiel Lamash's work exemplifies the spirit of innovation in technology. His contributions to video processing not only showcase his skills as an inventor but also highlight the importance of collaboration in driving advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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