Chicago, IL, United States of America

Yawchang Chang

This inventor holds 1 USPTO granted patent. Top assignee: Michigan State University. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yawchang Chang. Retrieved from https://idiyas.com/inventor/yawchang-chang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Yawchang Chang: Innovator in Electromagnetic Curing Technology

Introduction

Yawchang Chang is a notable inventor based in Chicago, IL (US). He has made significant contributions to the field of electromagnetic curing technology. His innovative approach has led to the development of a unique apparatus that enhances the curing process of materials.

Latest Patents

Yawchang Chang holds a patent for an "Electromagnetic curing apparatus and method of use." This microwave apparatus features conductive fingers that contact the material to be processed, along with knife edges that prevent leakage of microwaves. The design allows for modifications to accommodate various materials and die cross-sections. This technology is particularly beneficial for curing electrically conductive resin impregnated fibers. He has 1 patent to his name.

Career Highlights

Chang is affiliated with Michigan State University, where he continues to advance his research and development efforts. His work has garnered attention for its practical applications in various industries.

Collaborations

He has collaborated with esteemed colleagues such as Jianghua Wei and Valerie Adegbite, contributing to a dynamic research environment.

Conclusion

Yawchang Chang's innovative contributions to electromagnetic curing technology exemplify the impact of dedicated research and development in advancing industrial processes. His work continues to influence the field and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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