Yatir Linden

Title: Yatir Linden: Innovator in Metrology Systems

Introduction

Yatir Linden is a notable inventor based in Zichron Ya'akov, Israel. He has made significant contributions to the field of metrology, particularly through his innovative patent that addresses systematic errors in measurement systems.

Latest Patents

Yatir Linden holds a patent for a "Predicting tool induced shift using Moiré overlay targets." This metrology system is designed to enhance the accuracy of measurements by utilizing Moiré structures formed from overlapping first-layer and second-layer features. The system captures images from two detectors, allowing for the resolution of features that may be unresolved in initial images. This innovative approach enables the generation of precise metrology measurements and the identification of systematic errors.

Career Highlights

Yatir Linden's career is marked by his work at Kla Con, where he has applied his expertise in metrology systems. His contributions have been instrumental in advancing the technology used in measurement systems, making them more reliable and efficient.

Collaborations

Throughout his career, Yatir has collaborated with talented individuals such as Nadav Gutman and Boaz Ophir. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Yatir Linden is a distinguished inventor whose work in metrology systems has made a significant impact in the field. His innovative patent demonstrates his commitment to enhancing measurement accuracy and reliability.