Nagano, Japan

Yasutugu Aoki

This inventor holds 1 USPTO granted patent. Top assignee: Seiko Epson Corporation. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasutugu Aoki. Retrieved from https://idiyas.com/inventor/yasutugu-aoki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 30(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Yasutugu Aoki: Innovator in Surface Treatment Technology

Introduction

Yasutugu Aoki is a prominent inventor based in Nagano-ken, Japan. He is known for his contributions to the field of surface treatment technology. With a focus on innovation, Aoki has made significant strides in enhancing the efficiency and effectiveness of surface treatment processes.

Latest Patents

Aoki holds a patent for a surface treatment apparatus. This invention showcases his expertise and commitment to advancing technology in his field. The patent reflects his innovative approach to solving complex problems associated with surface treatment.

Career Highlights

Aoki is currently employed at Seiko Epson Corporation, where he continues to develop and refine technologies related to his area of expertise. His work at this esteemed company has allowed him to contribute to various projects that push the boundaries of surface treatment applications.

Collaborations

Aoki has collaborated with talented coworkers, including Takeshi Miyashita and Takuya Miyakawa. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Yasutugu Aoki is a dedicated inventor whose work in surface treatment technology has made a lasting impact. His patent and collaborations highlight his innovative spirit and commitment to advancing the field. Aoki's contributions continue to inspire future developments in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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