Aichi, Japan

Yasutoshi Iriyama


Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Yasutoshi Iriyama

Introduction

Yasutoshi Iriyama, an inventive mind hailing from Aichi, Japan, has made significant contributions to the field of nanotechnology. With a focus on aerosol gas deposition methods, Iriyama's work showcases the intersection of innovation and practical application in material science.

Latest Patents

Iriyama holds a patent for a deposition method using aerosol gas deposition for depositing particles on a substrate. This innovative process involves placing fine particles in an airtight container, which are obtained by forming a coating layer on a matrix surface. The method utilizes an aerosol generated by introducing a carrier gas into the container, allowing for the transportation of charged fine particles to a deposition chamber. This chamber is maintained at a lower pressure, facilitating the deposition of charged particles onto a substrate through a nozzle. The patent exemplifies Iriyama's expertise in enhancing material applications through advanced methodologies.

Career Highlights

Throughout his career, Yasutoshi Iriyama has been associated with notable organizations. He worked at Fuchita Nanotechnology Ltd., where he likely collaborated on innovative projects in the field of nanotechnology, as well as at National University Corporation Nagoya University, contributing to academic research and development in scientific disciplines.

Collaborations

During his professional journey, Iriyama collaborated with Eiji Fuchita, furthering advancements in nanotechnology and contributing to the collective knowledge of aerosol deposition methods. Such collaborations have been essential in driving forward the innovations that both individuals are known for.

Conclusion

Yasutoshi Iriyama stands as a prominent figure in the realm of innovative technologies, particularly within aerosol gas deposition techniques. His patent reflects a dedication to enhancing the methodology of material deposition, showcasing the potential applications in various scientific fields. Through his work and collaborations, Iriyama continues to leave a lasting impact in the world of nanotechnology.

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