Saitama, Japan

Yasushi Sakai

This inventor holds 1 USPTO granted patent. Top assignee: Kabushiki Kaisha Riken. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasushi Sakai. Retrieved from https://idiyas.com/inventor/yasushi-sakai-cvgem5tk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Yasushi Sakai: Innovator in Electromagnetic Wave Absorption

Introduction

Yasushi Sakai is a notable inventor based in Saitama-ken, Japan. He has made significant contributions to the field of electromagnetic wave absorption. His innovative work focuses on creating materials that can effectively absorb electromagnetic waves while maintaining excellent formability.

Latest Patents

Sakai holds a patent for a flame-retardant electromagnetic wave absorber. This invention is designed to exhibit superior electromagnetic wave-absorbing properties and can be easily assembled and constructed. The electromagnetic wave absorber consists of a wave-absorbing body and a base plate that supports it. The wave-absorbing body is uniquely formed in a pyramid shape by fitting polygonal wave-absorbing plates into each other. This design enhances its effectiveness in absorbing electromagnetic waves.

Career Highlights

Yasushi Sakai is associated with Kabushiki Kaisha Riken, a company known for its advancements in scientific research and technology. His work at Riken has allowed him to explore innovative solutions in the field of materials science.

Collaborations

Sakai collaborates with Toshikatsu Hayashi, contributing to the development of new technologies and enhancing the capabilities of their inventions.

Conclusion

Yasushi Sakai's contributions to the field of electromagnetic wave absorption demonstrate his innovative spirit and commitment to advancing technology. His work continues to influence the development of effective materials in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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