Yasushi Ohyama

Title: Yasushi Ohyama: Innovator in Semiconductor Technology

Introduction

Yasushi Ohyama is a prominent inventor based in Kodaira, Japan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to device manufacturing.

Latest Patents

One of his latest patents is a method of producing a contact plug. This method involves several steps, including forming a window or contact hole in an insulating layer to expose a portion of a semiconductor substrate or a lower conductor line. It also includes forming semiconductor material, specifically silicon, in the window and substituting this material with a metal, tungsten, through a reaction with a metal compound, WF.sub.6 gas. Additionally, he has developed an apparatus for plasma chemical vapor deposition. This apparatus is designed to form a deposited film on a base body by introducing a gas of a compound into a chamber and converting the gas into plasma using high-frequency electric power. It features a gas feeding pipe and a heating device that prevents gas from condensing or solidifying, allowing for stable plasma CVD using various compounds.

Career Highlights

Yasushi Ohyama is currently employed at Fujitsu Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing the efficiency and effectiveness of semiconductor devices.

Collaborations

He has collaborated with notable coworkers, including Yoshimi Shioya and Mamoru Maeda, contributing to a dynamic and innovative work environment.

Conclusion

Yasushi Ohyama's contributions to semiconductor technology through his patents and work at Fujitsu Corporation highlight his role as a key innovator in the field. His inventions are paving the way for advancements in semiconductor manufacturing.