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For the Inventor, By the Inventor

Saitama, Japan

Yasuo Shigemitsu

USPTO Granted Patents = 12

Average Co-Inventor Count = 3.7

ph-index = 5

Forward Citations = 91(Granted Patents)


Location History:

  • Urawa-shi, Saitama-ken, JP (1988)
  • Omiya, JP (2003 - 2004)
  • Saitama, JP (1993 - 2010)

Company Filing History:

goldMedal8 out of 630 
 
Dainippon Ink and Chemicals, Incorporated
 patents
silverMedal1 out of 21 
 
Institute of Medicinal Molecular Design, Inc.
 patents
bronzeMedal3 out of 832,680 
Other
 patents

Years Active: 1988-2010

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12 patents (USPTO):Explore Patents
1. 7671219 - Method for manufacturing fullerene derivatives (2010-03-02),
2. 6709804 - Printed wiring board and semiconductor device and processes to prepare the same (2004-03-23),
3. 6528231 - PHOTOSENSITIVE RESIN COMPOSITION, PRINTED WIRING BOARD, SUBSTRATE FOR DISPOSING SEMICONDUCTOR CHIPS, SEMICONDUCTOR DEVICE AND PROCESSES FOR PRODUCING A PRINTED WIRING BOARD, A SUBSTRATE FOR DISPOSING SEMICONDUCTOR CHIPS AND A SEMICONDUCTOR DEVICE (2003-03-04),
4. 5766833 - Process of forming super high-contrast negative images and silver halide (1998-06-16),
5. 5683854 - Process of forming super high-contrast negative images and silver halide (1997-11-04),
6. 5460919 - Process of forming super high-contrast negative images and silver halide (1995-10-24),
7. 5372911 - Process of forming super high-contrast negative images and silver halide (1994-12-13),
8. 5362621 - Direct positive silver halide photographic material and method for (1994-11-08),
9. 5284733 - High-contrast image forming process (1994-02-08),
10. 5275915 - Developer for light-sensitive material (1994-01-04),
11. 5217842 - Superhigh contrast negative image forming process (1993-06-08),
12. 4724196 - Silver halide photographic lith material (1988-02-09),

Title: Yasuo Shigemitsu: Innovator in Fullerene Derivatives and Semiconductor Technology

Introduction

Yasuo Shigemitsu is a prominent inventor based in Saitama, Japan. He has made significant contributions to the fields of fullerene derivatives and semiconductor technology. With a total of 12 patents to his name, Shigemitsu has established himself as a key figure in innovation.

Latest Patents

One of his latest patents is a method for manufacturing fullerene derivatives. This method provides a convenient way to produce fullerene 1,3-dioxolane at high yield. The process involves reacting a fullerene oxide with a carbonyl compound in the presence of a catalyst. Another notable patent focuses on printed wiring boards and semiconductor devices. This invention describes a substrate for disposing semiconductor chips, which is prepared by coating a substrate with a photosensitive resin composition. This composition includes an oxygen sensitizer and a cis-diene-substituted polyamic acid or polyimide. The process allows for the formation of fine patterns through exposure to radiation, resulting in a resin layer with excellent heat resistance.

Career Highlights

Throughout his career, Yasuo Shigemitsu has worked with Dainippon Ink and Chemicals, Incorporated, among other companies. His work has significantly impacted the development of advanced materials and technologies in the semiconductor industry.

Collaborations

Shigemitsu has collaborated with notable individuals in his field, including Yasuhiko Kojima and Naoki Obi. These collaborations have further enhanced his contributions to innovation.

Conclusion

Yasuo Shigemitsu's work in the field of fullerene derivatives and semiconductor technology showcases his innovative spirit and dedication to advancing technology. His numerous patents reflect his expertise and commitment to research and development.

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