This inventor holds 1 USPTO granted patent. Top assignee: Dai Nippon Printing Co., Ltd.. Active years: 2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2014
Title: Yasunori Nagatsuka: Innovator in Negative Resist Composition
Introduction: Yasunori Nagatsuka, a notable inventor based in Tokyo-to, Japan, has made significant contributions to the field of material science with his innovative work on negative resist compositions. His patent focuses on improving pattern formation efficiency for advanced lithography techniques, particularly in the realms of electron beam and extreme ultraviolet (EUV) exposure.
Latest Patents: Nagatsuka holds a patent for a crosslinking agent, negative resist composition, and a pattern forming method utilizing this negative resist composition. This negative resist composition displays excellent sensitivity and resolution, making it suitable for high-precision applications. The composition includes a polyphenol compound with multiple phenolic hydroxyl groups, an acid generator for producing acid upon exposure to high-energy rays, and a novel crosslinking agent characterized by a specific chemical formula. This innovative approach addresses critical challenges in pattern formation, enhancing the capabilities of current lithographic techniques.
Career Highlights: Yasunori Nagatsuka's commitment to advancing technology is evident through his position at Dai Nippon Printing Co., Ltd. His work not only showcases his inventiveness but also contributes to the company's reputation as a leader in printing and materials technology. With only one patent to his name thus far, his contributions are noteworthy for their potential impact on the industry.
Collaborations: Throughout his career, Nagatsuka has collaborated with fellow inventor Kenichi Okuyama. Together, they have worked on projects that enhance the performance and applicability of negative resist compositions, significantly pushing the boundaries of current technology.
Conclusion: Yasunori Nagatsuka stands out as an influential figure in the field of lithography and material science. His innovative patent on negative resist compositions not only reflects his expertise but also promises to influence future developments in the industry. As technology in this arena continues to evolve, the work of inventors like Nagatsuka will play a pivotal role in shaping its future landscape.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile