Okayama, Japan

Yasujiro Ohara

This inventor holds 1 USPTO granted patent. Top assignee: Kuraray Co., Ltd.. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasujiro Ohara. Retrieved from https://idiyas.com/inventor/yasujiro-ohara-lwahav45

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Yasujiro Ohara: Innovator in Dental Materials

Introduction

Yasujiro Ohara is a notable inventor based in Okayama, Japan. He has made significant contributions to the field of dental materials, particularly through his innovative patent. His work focuses on enhancing the quality and durability of dental composites, which are essential in modern dentistry.

Latest Patents

Yasujiro Ohara holds a patent for "Fillings and composite dental materials containing the fillings." This invention provides a filler that boasts high water resistance and acid resistance, along with excellent ion releasing abilities, such as fluorine ions. The dental composite material he developed maintains high aesthetic appreciation over an extended period, making it a valuable asset in dental applications.

Career Highlights

Ohara is associated with Kuraray Co., Ltd., a company known for its advancements in dental and medical materials. His work has contributed to the development of products that enhance patient care and treatment outcomes in dentistry.

Collaborations

Yasujiro Ohara has collaborated with notable colleagues, including Hirotaka Kita and Koichi Okada. Their combined expertise has furthered innovations in dental materials and technologies.

Conclusion

Yasujiro Ohara's contributions to dental materials through his patent demonstrate his commitment to improving dental care. His innovative approach continues to influence the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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