Hino, Japan

Yasuji Muroi

This inventor holds 1 USPTO granted patent. Top assignee: Konishiroku Photo Industry Co., Ltd.. Active years: 1980.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 1980

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1 patent (USPTO):Explore Patents

Title: Yasuji Muroi: Innovator in Adhesive Technology

Introduction

Yasuji Muroi is a notable inventor based in Hino, Japan. He has made significant contributions to the field of adhesive technology, particularly through his innovative patent. His work has implications for various industries that rely on effective bonding materials.

Latest Patents

Muroi holds a patent for a "Plastic support having improved adhesiveness to material to be bonded." This invention features a hydrophobic plastic support that includes a layer comprising a copolymer. The copolymer consists essentially of an acrylic monomer selected from alkyl esters of acrylic acid and alkyl esters of methacrylic acid, along with an ethylenically unsaturated monomer that has a specific functional group.

Career Highlights

Throughout his career, Muroi has been associated with Konishiroku Photo Industry Co., Ltd. His work at this company has allowed him to focus on developing advanced materials that enhance the performance of adhesive products. His innovative approach has led to the creation of solutions that meet the evolving needs of the market.

Collaborations

Muroi has collaborated with notable colleagues, including Hideyasu Ohta and Masaru Kanbe. These partnerships have fostered a creative environment that encourages the exchange of ideas and expertise, further advancing their collective work in adhesive technology.

Conclusion

Yasuji Muroi's contributions to adhesive technology through his patent demonstrate his innovative spirit and commitment to improving bonding materials. His work continues to influence the industry and showcases the importance of research and development in creating effective solutions.

Profile summary based on public USPTO records.
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