Suwa, Japan

Yasuhiro Mita

This inventor holds 1 USPTO granted patent. Top assignee: Seiko Epson Corporation. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasuhiro Mita. Retrieved from https://idiyas.com/inventor/yasuhiro-mita-y6z87him

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: Yasuhiro Mita: Innovator in Image Formation Technology

Introduction

Yasuhiro Mita is a notable inventor based in Suwa, Japan. He has made significant contributions to the field of image formation technology, particularly through his innovative patent work. His expertise and dedication to advancing technology have positioned him as a key figure in his industry.

Latest Patents

Yasuhiro Mita holds a patent titled "Heat protection of photosensitive elements in image formation apparatus." This invention addresses critical challenges in maintaining the integrity and performance of photosensitive elements, which are essential for high-quality image formation.

Career Highlights

Mita is currently employed at Seiko Epson Corporation, a leading company in imaging and printing technology. His work at Epson has allowed him to focus on developing solutions that enhance the functionality and reliability of imaging devices.

Collaborations

Throughout his career, Yasuhiro Mita has collaborated with talented individuals such as Saburo Furukawa and Atsushi Kobayashi. These partnerships have fostered innovation and contributed to the success of various projects within the company.

Conclusion

Yasuhiro Mita's contributions to image formation technology through his patent and work at Seiko Epson Corporation highlight his role as an influential inventor. His dedication to innovation continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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