Yasuhiro Hamada

Title: Yasuhiro Hamada: Innovator in Wafer Processing Technology

Introduction

Yasuhiro Hamada is a prominent inventor based in Yamanashi, Japan. He has made significant contributions to the field of wafer processing, holding a total of 3 patents. His innovative approaches have advanced the technology used in semiconductor manufacturing.

Latest Patents

Hamada's latest patents include a wafer processing method and a substrate processing system. The wafer processing method involves preparing a wafer with a substrate and a silicon-containing film, forming a hard mask, and etching the silicon-containing film using the hard mask. This method incorporates a hard mask with a first film containing tungsten and a second film containing zirconium or titanium and oxygen. The substrate processing system features an etching apparatus that supplies a gas containing fluorocarbon to generate plasma for etching a silicon film on a substrate. This system also includes a film forming apparatus that supplies a gas containing carbon to form a carbon film on the etched silicon film.

Career Highlights

Hamada is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His work focuses on developing advanced technologies that enhance the efficiency and effectiveness of wafer processing.

Collaborations

Throughout his career, Hamada has collaborated with notable coworkers, including Akinobu Kakimoto and Yoshinobu Hayakawa. These collaborations have contributed to the advancement of innovative solutions in the field.

Conclusion

Yasuhiro Hamada's contributions to wafer processing technology demonstrate his expertise and commitment to innovation. His patents reflect a deep understanding of the complexities involved in semiconductor manufacturing, positioning him as a key figure in the industry.