Tokyo, Japan

Yasuharu Okamoto

USPTO Granted Patents = 4 

Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 15(Granted Patents)


Location History:

  • Tokyo, JP (2014 - 2017)
  • Ehime, JP (2018)

Company Filing History:


Years Active: 2014-2018

Loading Chart...
4 patents (USPTO):Explore Patents

Title: Yasuharu Okamoto: Innovator in Ion Implantation Technology

Introduction

Yasuharu Okamoto is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of ion implantation technology, holding a total of four patents. His innovative work has advanced the capabilities of ion implantation apparatuses, which are crucial in semiconductor manufacturing.

Latest Patents

One of Yasuharu Okamoto's latest patents is an ion implantation apparatus designed to perform multiple ion implantation processes with varying conditions on the same wafer. This apparatus allows for twist angles of the wafer to differ, enabling a more efficient and precise implantation process. Additionally, it features a control device that executes a setup process to determine scanning parameters collectively before the implantation processes begin. Another notable patent is an ion implantation method that involves transporting ions to a wafer as an ion beam. This method includes mechanical slow scanning of the wafer while simultaneously allowing for fast scanning of the ion beam or the wafer in a perpendicular direction. The two-dimensional beam shape of the ion beam is measured before implantation, ensuring accurate regulation of the implantation region.

Career Highlights

Yasuharu Okamoto has worked with notable companies in the industry, including Sen Corporation and Sumitomo Heavy Industries Ion Technology Co., Ltd. His experience in these organizations has contributed to his expertise in ion implantation technology and its applications in semiconductor manufacturing.

Collaborations

Throughout his career, Yasuharu Okamoto has collaborated with esteemed colleagues such as Shiro Ninomiya and Akihiro Ochi. These collaborations have further enriched his work and innovations in the field.

Conclusion

Yasuharu Okamoto's contributions to ion implantation technology have made a significant impact on the semiconductor industry. His innovative patents and collaborations highlight his dedication to advancing this critical field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…