Osaka, Japan

Yasuaki Ide

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Sekisui Chemical Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasuaki Ide. Retrieved from https://idiyas.com/inventor/yasuaki-ide-bgg96whk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Yasuaki Ide: Innovator in Radio Wave Technology

Introduction

Yasuaki Ide is a prominent inventor based in Osaka, Japan. He is known for his innovative contributions to radio wave technology. His work focuses on enhancing the efficiency and effectiveness of radio wave reflectors.

Latest Patents

Yasuaki Ide holds a patent for a radio wave reflector. This invention is designed to reflect radio waves while maintaining their intensity and preserving the surrounding scenery. The radio wave reflector can achieve a reflective wave intensity of −30 dB or more relative to the incident wave intensity at a specific frequency. Additionally, it boasts a total light transmittance of 65% or more, as measured using a standard illuminant D65.

Career Highlights

Yasuaki Ide is associated with Sekisui Chemical Corporation, where he applies his expertise in radio wave technology. His work has contributed significantly to advancements in the field, showcasing his commitment to innovation.

Collaborations

Yasuaki Ide collaborates with notable colleagues, including Hiroyuki Nomoto and Munehiro Hatai. Their combined efforts in research and development have furthered the progress of radio wave technologies.

Conclusion

Yasuaki Ide's contributions to radio wave technology exemplify his innovative spirit and dedication to enhancing communication systems. His patent for a radio wave reflector highlights his ability to merge functionality with aesthetic considerations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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