This inventor holds 1 USPTO granted patent. Top assignee: Nippon Control System Corporation. Active years: 2025.
Company Filing History:
Years Active: 2025
Title: Yasuaki Horima: Innovator in Mask Information Adjustment Technology
Introduction
Yasuaki Horima is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of mask information adjustment technology. His innovative approach addresses challenges faced in producing precise exposure patterns in photomasks.
Latest Patents
Yasuaki Horima holds a patent for a "Mask information adjusting apparatus, mask data adjusting method, and program." This invention aims to solve the problem of large data sizes in conventional mask information adjusting apparatuses. The apparatus includes a subject information acquiring unit that collects pre-adjustment mask information containing a polygonal mask pattern. A processing unit evaluates the influence of removing each vertex or side of the mask pattern on the generated exposure pattern. It simplifies the mask pattern by removing vertices or sides based on predetermined conditions. Finally, an output unit provides post-adjustment mask information that reflects the simplified mask pattern.
Career Highlights
Yasuaki Horima is associated with Nippon Control System Corporation, where he continues to develop innovative solutions in his field. His work has been instrumental in advancing technologies related to photomasks and exposure patterns.
Collaborations
Yasuaki collaborates with Dai Tsunoda, contributing to the development of advanced technologies in mask information adjustment.
Conclusion
Yasuaki Horima's contributions to mask information adjustment technology highlight his innovative spirit and dedication to solving complex problems in the field. His patent reflects a significant advancement that can enhance the efficiency of photomask production.