Yao Dalin

Title: Yao Dalin: Innovator in Semiconductor Technology

Introduction

Yao Dalin is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent. His work focuses on improving the accuracy of pattern transfer in semiconductor structures.

Latest Patents

Yao Dalin holds a patent for a semiconductor structure and a forming method thereof. The patent outlines a method that includes providing a base, forming discrete mandrel layers, and creating spacer layers that cover the side walls of the mandrel layers. The process involves forming a pattern transfer layer, creating trenches, and etching the base to achieve a target pattern. This method enhances the precision of pattern transfer, which is crucial in semiconductor manufacturing.

Career Highlights

Throughout his career, Yao Dalin has worked with notable companies in the semiconductor industry. He has been associated with Semiconductor Manufacturing International (Shanghai) Corporation and Semiconductor Manufacturing International (Beijing) Corporation. His experience in these organizations has contributed to his expertise in semiconductor technology.

Collaborations

Yao has collaborated with several professionals in his field, including Zhu Chen and He Zuopeng. These collaborations have further enriched his work and contributed to advancements in semiconductor technology.

Conclusion

Yao Dalin is a key figure in the semiconductor industry, known for his innovative patent and contributions to technology. His work continues to influence the field and improve manufacturing processes.