Yansheng Wang

Title: Yansheng Wang: Innovator in Wafer Image Detection

Introduction

Yansheng Wang is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly in the area of wafer image analysis. His innovative approach has led to the development of a unique method for detecting anomalies in wafer backside brightfield images.

Latest Patents

Yansheng Wang holds a patent for a method titled "Method for automatically detecting wafer backside brightfield image anomaly." This patent outlines a process that includes histogram equalization of wafer backside brightfield images to obtain processed images. The method involves compiling statistics for a gray histogram of these processed images, calculating the number of abnormal pixels, and providing a threshold to highlight images with scores below this threshold. This technique allows for quick and automatic detection of abnormal wafer backside images.

Career Highlights

Yansheng Wang is currently employed at Shanghai Huali Microelectronics Corporation, where he continues to advance his research and development efforts. His work has been instrumental in improving the efficiency and accuracy of wafer inspections in the semiconductor industry.

Collaborations

Yansheng collaborates with talented colleagues, including Junjun Zhuang and Xu Chen, who contribute to the innovative projects at Shanghai Huali Microelectronics Corporation.

Conclusion

Yansheng Wang's contributions to wafer image detection exemplify the importance of innovation in the semiconductor industry. His patented method not only enhances the detection process but also showcases his commitment to advancing technology in this critical field.