Yanping Li

Title: Innovations by Yanping Li

Introduction

Yanping Li is a prominent inventor based in Mountain View, CA, known for her significant contributions to the field of semiconductor technology. With a total of 4 patents to her name, she has made remarkable advancements in manufacturing processes and materials used in electronic devices.

Latest Patents

Among her latest patents is a method for creating a silicon-containing structure with deep etched features. This innovative technique allows for the plasma etching of deeply recessed features, such as trenches of at least 5 µm in depth, in a silicon-containing substrate. The method ensures the generation of smooth sidewalls with a roughness of less than about 1 µm, typically between 100 nm and 20 nm. Additionally, her patent on a transparent zinc oxide electrode highlights a method of reactively sputtering from a metallic zinc target to create a transparent conductive oxide electrode. This process is particularly beneficial for silicon photo diode devices and solar cells, as it enhances conductivity and optimizes the refractive index.

Career Highlights

Yanping Li is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. Her work focuses on developing advanced manufacturing techniques that improve the efficiency and performance of electronic devices.

Collaborations

Throughout her career, Yanping has collaborated with notable colleagues, including Jeffrey D. Chinn and Michael Rattner, contributing to various innovative projects and research initiatives.

Conclusion

Yanping Li's contributions to semiconductor technology and her innovative patents reflect her expertise and dedication to advancing the field. Her work continues to influence the development of more efficient electronic devices, showcasing the importance of innovation in technology.