San Jose, CA, United States of America

Yanhua Wang

This inventor holds 3 USPTO granted patents. Top assignee: Lsi Logic Corporation. Active years: 2000-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yanhua Wang. Retrieved from https://idiyas.com/inventor/yanhua-wang-vsrmpfku

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.3

ph-index = 3

Forward Citations = 25(Granted Patents)


Company Filing History:


Years Active: 2000-2004

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3 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Yanhua Wang - Pioneering Buried Channel Devices

Introduction: Yanhua Wang, a distinguished inventor based in San Jose, California, has made significant contributions to the field of semiconductor technology. With three patents to his name, Wang's innovations are at the forefront of advancing transistor and capacitor technologies.

Latest Patents: Among his latest patents is a groundbreaking invention related to buried channel devices and a process for their simultaneous fabrication with surface channel devices. This innovative method allows for the production of transistors and capacitors with multiple electrical gate oxides. The technology involves creating buried channel NMOS devices using a p-type substrate and an n-type implant. The design enables the formation of a conducting channel of mobile electrons using inversion bias, making it possible to fabricate CMOS devices with varying effective dielectric thicknesses on a single substrate.

Another notable patent addresses a shallow trench isolation chemical-mechanical polishing process. This technique involves creating a trench filled with insulating material in the surface of an integrated circuit substrate, wherein Wang’s approach significantly enhances the planarity of the insulating material and reduces defects in integrated circuit designs.

Career Highlights: Yanhua Wang currently works at LSI Logic Corporation, where he has played a vital role in advancing semiconductor fabrication processes. His extensive expertise in material science and engineering has paved the way for innovations that streamline manufacturing and enhance device performance.

Collaborations: Throughout his career, Wang has collaborated with talented colleagues such as Shouli Steve Hsia and Jayanthi Pallinti. Their teamwork in research and development has led to significant advancements in semiconductor technologies, showcasing the value of collaboration in driving innovation.

Conclusion: Yanhua Wang stands out as a visionary inventor whose work is transforming the semiconductor industry. With his innovative patents and collaborative spirit, Wang continues to push the boundaries of technology, contributing to the development of efficient and advanced electronic devices that are essential in today's digital age.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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