Ottawa, Canada

Yanguang Zhang

This inventor holds 1 USPTO granted patent. Top assignee: National Research Council of Canada. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yanguang Zhang. Retrieved from https://idiyas.com/inventor/yanguang-zhang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 2.0

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Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Yanguang Zhang: Innovator in Radiation Curable Polymer Formulations

Introduction

Yanguang Zhang is a prominent inventor based in Ottawa, Canada. He has made significant contributions to the field of polymer formulations, particularly in the development of radiation curable materials. His innovative work is essential for advancing technologies in flexible electronics.

Latest Patents

Yanguang Zhang holds a patent for a "Radiation curable polymer formulation and methods for the preparation thereof." This patent discloses a unique formulation that includes an acrylic monomer, a cross-linking agent, and a photoinitiator. The resulting polymer formulation is insoluble in organic solvents, making it particularly advantageous for low-cost, high-volume manufacturing of thin film transistors used in flexible electronics.

Career Highlights

Yanguang Zhang is affiliated with the National Research Council of Canada, where he conducts research and development in advanced materials. His work focuses on creating innovative solutions that enhance the performance and efficiency of electronic devices.

Collaborations

Yanguang collaborates with Marius Gabriel Ivan, contributing to the advancement of their research projects and innovations in the field of polymer science.

Conclusion

Yanguang Zhang's contributions to radiation curable polymer formulations are paving the way for new advancements in flexible electronics. His innovative approach and dedication to research continue to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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