This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Hefei University of Technology. Active years: 2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2014
Title: Innovations by Yangang He: A Novel Method for Cleaning Copper Surfaces in Integrated Circuits
Introduction: Yangang He, an accomplished inventor based in Tianjin, China, has made significant contributions to the field of materials science, particularly in the realm of ultra-large scale integrated circuits. His inventive work focuses on enhancing the cleaning processes for copper materials, which are essential in the manufacturing of modern electronic devices.
Latest Patents: Yangang He holds a patent for a method of cleaning copper material surfaces in ultra-large scale integrated circuits after polishing. This innovative method incorporates a unique mixture that includes between 1 and 4 wt. % of a surfactant, 0.5 and 3 wt. % of a chelating agent, and 0.1 and 5 wt. % of a corrosion inhibitor, all combined with deionized water to create a water-soluble cleaning solution. Notably, the pH value of this solution is maintained between 7.4 and 8.2. The washing process utilizes this cleaning solution under specific conditions, including pressure ranging from 2000 to 3000 Pa, a flow rate of 1000 to 5000 mL/min, and a washing time of at least 0.5 to 2 minutes. This patent addresses a critical need for effective cleaning methods post-polishing, thereby enhancing the reliability of copper components in electronic circuits.
Career Highlights: Yangang He is currently affiliated with Hefei University of Technology, where he contributes to ongoing research and innovation in the field of materials science. His expertise in developing cleaning processes for microelectronics plays a vital role in advancing the technology necessary for the production of smaller and more efficient circuits.
Collaborations: Over the course of his career, Yangang He has collaborated with notable colleagues, including Yuling Liu and Xiaoyan Liu. These collaborations have further strengthened his research and innovation efforts, allowing for a richer exchange of ideas and advancements in their shared fields of interest.
Conclusion: Yangang He stands out as a dedicated inventor making strides in the realm of integrated circuit technology. His patented method for cleaning copper surfaces not only demonstrates his innovative spirit but also contributes to the broader efforts of improving manufacturing processes in the electronics industry. His work, alongside his collaborative efforts, continues to foster advancements that are essential for the future of technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile