This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025
Title: Yang Yang - Innovator in Plasma Processing Technology
Introduction
Yang Yang is a notable inventor based in Singapore, recognized for his contributions to the field of plasma processing technology. He has developed innovative methods that enhance the efficiency and effectiveness of substrate processing in various applications.
Latest Patents
Yang Yang holds a patent for "Scanning impedance measurement in a radio frequency plasma processing chamber." This invention involves a method of processing a substrate in a plasma processing system. The process includes delivering an RF signal through an RF match to an electrode assembly while measuring impedance-related data to optimize the matching parameters for improved performance.
Career Highlights
Yang Yang is currently employed at Applied Materials, Inc., a leading company in materials engineering solutions. His work focuses on advancing technologies that support the semiconductor and display industries. His expertise in plasma processing has positioned him as a key contributor to innovative solutions in these sectors.
Collaborations
Yang collaborates with talented professionals such as Yue Guo and Kartik Ramaswamy. Together, they work on projects that push the boundaries of technology in plasma processing and related fields.
Conclusion
Yang Yang's innovative work in plasma processing technology exemplifies the impact of dedicated inventors in advancing industrial applications. His contributions continue to shape the future of substrate processing in significant ways.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
