Singapore, Singapore

Yang Yang

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yang Yang. Retrieved from https://idiyas.com/inventor/yang-yang-vdq8vwcx

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Yang Yang - Innovator in Plasma Processing Technology

Introduction

Yang Yang is a notable inventor based in Singapore, recognized for his contributions to the field of plasma processing technology. He has developed innovative methods that enhance the efficiency and effectiveness of substrate processing in various applications.

Latest Patents

Yang Yang holds a patent for "Scanning impedance measurement in a radio frequency plasma processing chamber." This invention involves a method of processing a substrate in a plasma processing system. The process includes delivering an RF signal through an RF match to an electrode assembly while measuring impedance-related data to optimize the matching parameters for improved performance.

Career Highlights

Yang Yang is currently employed at Applied Materials, Inc., a leading company in materials engineering solutions. His work focuses on advancing technologies that support the semiconductor and display industries. His expertise in plasma processing has positioned him as a key contributor to innovative solutions in these sectors.

Collaborations

Yang collaborates with talented professionals such as Yue Guo and Kartik Ramaswamy. Together, they work on projects that push the boundaries of technology in plasma processing and related fields.

Conclusion

Yang Yang's innovative work in plasma processing technology exemplifies the impact of dedicated inventors in advancing industrial applications. His contributions continue to shape the future of substrate processing in significant ways.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…