Shenzhen, China

Yan Xiaohan

This inventor holds 1 USPTO granted patent and 1 published patent application, plus 1 CIPO patent. Top assignee: Cricut, Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yan Xiaohan. Retrieved from https://idiyas.com/inventor/yan-xiaohan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Yan Xiaohan: Innovator in Sublimation Technology

Introduction

Yan Xiaohan is a notable inventor based in Shenzen, China. He has made significant contributions to the field of sublimation technology, particularly with his innovative patent. His work is recognized for its potential applications in various industries, enhancing the efficiency and quality of sublimation processes.

Latest Patents

Yan Xiaohan holds a patent for a "Sublimation layup sheet and method of sublimating ink." This invention involves a cut material that includes an infusible ink layup, a laminate layer, and a backing layer. The laminate layer is strategically placed between the infusible ink layup and the backing layer, optimizing the sublimation process.

Career Highlights

Yan is currently employed at Cricut, Inc., a company known for its cutting machines and crafting tools. His role at Cricut allows him to apply his innovative ideas and contribute to the development of new products that cater to the crafting community.

Collaborations

Yan collaborates with talented coworkers, including Alesha Younkin and Cindy Chen. Their teamwork fosters a creative environment that encourages the development of cutting-edge solutions in the crafting industry.

Conclusion

Yan Xiaohan's contributions to sublimation technology exemplify the spirit of innovation. His patent and work at Cricut, Inc. highlight his commitment to advancing the field and providing valuable tools for creators.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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