Suzhou, China

Yaming Fan


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Biography of Inventor Yaming Fan

Introduction: Yaming Fan is a notable inventor based in Suzhou, China. He has made significant contributions to the field of materials science, particularly in the development of gallium oxide films.

Latest Patents: Yaming Fan holds a patent for a "Gallium oxide film based on sapphire substrate as well as growth method and application thereof." This patent describes a method for preparing gallium oxide films on sapphire substrates, which includes forming multiple α-(AlGa)O strain buffering layers and gallium oxide epitaxial layers. The method addresses the technical challenges associated with epitaxial growth and improves the crystal quality of the materials.

Career Highlights: Yaming Fan is affiliated with the Chinese Academy of Sciences, where he conducts research and development in advanced materials. His work has been recognized for its innovative approach to solving complex problems in material growth.

Collaborations: Throughout his career, Yaming Fan has collaborated with esteemed colleagues, including Xiaodong Zhang and Baoshun Zhang. These collaborations have contributed to the advancement of research in the field of gallium oxide materials.

Conclusion: Yaming Fan's contributions to the field of materials science, particularly through his patent on gallium oxide films, highlight his role as an influential inventor. His work continues to impact the development of advanced materials in various applications.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…