Yamile A M Wasslen

Title: Yamile A M Wasslen: Innovator in Atomic Layer Deposition Technologies

Introduction

Yamile A M Wasslen is a prominent inventor based in Ottawa, Canada. He has made significant contributions to the field of atomic layer deposition (ALD) technologies. With a total of 7 patents to his name, Wasslen has established himself as a key figure in the development of advanced materials.

Latest Patents

Wasslen's latest patents focus on innovative processes for producing metal-containing thin films. One of his notable inventions is the ALD of metal-containing films using cyclopentadienyl compounds. This process involves feeding vapor phase pulses of metal-containing cyclopentadienyl precursors into a reaction space. The preferred embodiments of this invention ensure that the metal atom is not directly bonded to an oxygen or halide atom. Another significant patent is the ALD of hafnium-containing films using similar cyclopentadienyl compounds, which also emphasizes the unique bonding characteristics of the metal atom.

Career Highlights

Throughout his career, Wasslen has worked with various companies, including Asm IP Holding B.V. His expertise in ALD technologies has positioned him as a valuable asset in the field of materials science. His innovative approaches have led to advancements that are crucial for various applications in electronics and materials engineering.

Collaborations

Wasslen has collaborated with notable professionals in his field, including Sean T Barry and Antti H Rahtu. These collaborations have further enhanced his research and development efforts, contributing to the success of his patented technologies.

Conclusion

Yamile A M Wasslen is a distinguished inventor whose work in atomic layer deposition has paved the way for advancements in material science. His contributions continue to influence the industry and inspire future innovations.