Lansing, MI, United States of America

Yajun Gu


 

Average Co-Inventor Count = 5.3

ph-index = 3

Forward Citations = 25(Granted Patents)


Location History:

  • Lansing, MI (US) (2012 - 2015)
  • Okemos, MI (US) (2018)
  • Boise, ID (US) (2019 - 2023)

Company Filing History:


Years Active: 2012-2023

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6 patents (USPTO):Explore Patents

Title: **Yajun Gu: Innovator in Microwave Plasma Technology**

Introduction

Yajun Gu is a prominent inventor based in Lansing, MI, with a noteworthy portfolio of six patents. His groundbreaking work primarily focuses on microwave plasma assisted chemical vapor deposition (MPACVD) technologies, which are critical in the fabrication of advanced materials such as diamonds.

Latest Patents

Gu's latest patents relate to methods and apparatus for microwave plasma assisted chemical vapor deposition reactors. These innovations include the development of microwave cavity plasma reactor (MCPR) apparatus and associated tuning and process control methods. His inventions enable the precise control of microwave discharge position, size, and shape, ensuring efficient coupling of microwave power into the reactor during component deposition. The pre-deposition tuning processes he developed lead to a high plasma reactor coupling efficiency across various operating conditions, allowing for the adjustment of input parameters without compromising performance. Furthermore, he has introduced real-time process control methods that effectively manage process variables throughout the deposition process, thus enhancing overall efficiency.

Career Highlights

Yajun Gu has had a significant impact on the field of materials science and engineering through his tenure at notable institutions. He has worked with Michigan State University, where he contributed to advanced research initiatives. Additionally, he held a position at Fraunhofer USA, Inc., furthering innovation in applied science and technology.

Collaborations

Throughout his career, Gu has collaborated with esteemed colleagues like Jes Asmussen and Jing Lu. These partnerships have enabled him to advance his research and contribute to significant technological advancements in the field of chemical vapor deposition.

Conclusion

Yajun Gu's contributions to microwave plasma technology and chemical vapor deposition are invaluable, marking him as a key figure in the future of advanced materials fabrication. With his innovative patents and collaborative spirit, he continues to pave the way for new developments in this vital area of research.

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