Yajuan Su

Title: Yajuan Su: Innovator in Semiconductor Technology

Introduction

Yajuan Su is a prominent inventor based in Beijing, China. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his innovative approach to optimizing mask parameters and manufacturing semiconductor devices.

Latest Patents

One of Yajuan Su's latest patents is a method and device for optimizing mask parameters. This patent outlines a process that includes acquiring a test pattern, light source parameters, and initial mask parameters. The method generates multiple sets of candidate mask parameters, which include different mask sidewall angles while maintaining the same mask thickness. By obtaining imaging contrasts for each set of candidate parameters, the optimal mask sidewall angle can be selected, significantly improving imaging contrast and resolution.

Another notable patent is a method for manufacturing semiconductor devices. This method involves forming a photolithographic coating on a to-be-connected structure, which includes a first film, a photolithographic film, and a second film. The refractive indexes of the first and second films are designed to be smaller than 1, creating an optical structure with a high reflection coefficient. The coating is then exposed to light through a mask, allowing both the to-be-connected structure and the mask pattern to be imaged onto the photolithographic film.

Career Highlights

Yajuan Su is affiliated with the Chinese Academy of Sciences, where he continues to advance research in semiconductor technology. His work has been instrumental in developing methods that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Yajuan collaborates with notable colleagues, including Libin Zhang and Yayi Wei, who contribute to his research endeavors. Their combined expertise fosters an environment of innovation and discovery in the field.

Conclusion

Yajuan Su's contributions to semiconductor technology through his patents and collaborative efforts highlight his role as a leading inventor in the industry. His innovative methods for optimizing mask parameters and manufacturing processes are paving the way for advancements in semiconductor devices.