Company Filing History:
Years Active: 2013-2016
Title: The Innovative Contributions of Ya-Ping Chang
Introduction
Ya-Ping Chang is a notable inventor based in Chiayi County, Taiwan. He has made significant contributions to the field of technology, particularly in the development of advanced exposure apparatuses and methods for forming patterned layers. With a total of 3 patents to his name, Chang's work has had a considerable impact on the industry.
Latest Patents
Chang's latest patents include a "Method of forming patterned layer," a "Method of forming patterned photoresist layer," and an "Active device array substrate." His exposure apparatus is designed to expose a photoresist layer on a substrate to create multiple strip exposed patterns. The apparatus consists of a light source, a lens group, and a mask. The lens group, positioned between the photoresist layer and the light source, features several strip lenses arranged parallel to one another. The overlapping regions between neighboring strip lenses are defined as lens connecting regions, while the remaining areas are classified as lens regions. The mask, located between the photoresist layer and the lens group, contains various shielding patterns that correspond to the strip exposed patterns. Each shielding pattern includes a strip opening, with the extension direction of the openings being substantially parallel to that of the shielding patterns.
Career Highlights
Ya-Ping Chang is currently employed at AU Optronics Corporation, where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of exposure apparatuses used in various applications.
Collaborations
Chang has collaborated with several talented individuals in his field, including Hsiang-Chih Hsiao and Ta-Wen Liao. These collaborations have further enhanced the quality and impact of his inventions.
Conclusion
Ya-Ping Chang's contributions to the field of technology through his innovative patents and collaborations highlight his importance as an inventor. His work continues to influence advancements in exposure apparatuses and patterned layer formation.