Company Filing History:
Years Active: 2025
Title: Y L Cheng - Innovator in Semiconductor Fabrication
Y L Cheng is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of gate processing.
Latest Patents
Y L Cheng holds a patent for a method titled "Multipatterning gate processing." This innovative method provides techniques for fabricating semiconductor structures. An exemplary method includes forming a first transistor structure and a second transistor structure over a substrate, wherein each transistor structure includes at least one nanosheet. The method further includes depositing a metal over each transistor structure and around each nanosheet, followed by depositing a coating over the metal. A mask is then deposited over the coating, and the mask is patterned to define a patterned mask. This patterned mask lies over a masked portion of the coating and the second transistor structure, while it does not lie over an unmasked portion of the coating and the first transistor structure. The method concludes with etching the unmasked portion of the coating and the metal over the first transistor structure using a dry etching process with a process pressure ranging from 30 to 60 mTorr.
Career Highlights
Y L Cheng is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing semiconductor fabrication techniques.
Collaborations
Y L Cheng has collaborated with notable colleagues, including Tzu-Wen Pan and Yu-Hsien Lin, contributing to various projects within the semiconductor field.
Conclusion
Y L Cheng's innovative work in semiconductor fabrication, particularly through his patent on multipatterning gate processing, showcases his expertise and commitment to advancing technology in this critical industry. His contributions continue to influence the development of semiconductor structures.